Deep-Ultraviolet Microscope for NFP Measurement |
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| This deep-ultraviolet microscope is designed to measure the near-field pattern (NFP) of deep-ultraviolet laser diodes (DUV-LDs) with a lasing wavelength of 275 nm. Using an 80× objective lens and a UV CCD camera compatible with deep-ultraviolet light, the system observes the emitting facet of the laser diode at high magnification and measures the NFP. Two ND filters with different transmittances are installed so that the detected light intensity can be adjusted appropriately according to the laser output. Each ND filter is controlled by a motorized rotation stage and can be inserted into the detection path of the UV CCD camera as needed. A 275 nm deep-ultraviolet LED (DUV-LED) is used as the illumination source for sample observation. Because the emitting facet can be observed without lasing the laser diode, the measurement position and focus can be checked and adjusted before moving smoothly to NFP measurement. This enables accurate and efficient high-magnification evaluation of the emission state of deep-ultraviolet laser diodes. |
*Specifications and appearance are subject to change without notice for product improvement. |
